CMOS Compatible Fabrication of Mid Infrared Microspectrometers Based on an Array of Metamaterial Absorbers
Paper in proceeding, 2019

The design of a mid-infrared micro-spectrometer based on an array of differently tuned narrow-band metamaterial absorbers is presented. The spectral response is tailored by the design of the unit cell. Each spectral band is composed of a thermopile detector with a 300 ×180 μm2 Al-based metamaterial absorber fabricated in a CMOS compatible post-process. The challenges in the fabrication of the sub-μm features within the unit cell over a several mm2 absorber area by equipment that is part of the standard infrastructure of a MEMS facility is addressed. The design and fabrication method utilized here for the first time enables the CMOS fabrication of integrated large-area plasmonic components on thermal detectors.

MEMS spectrometer

CMOS Compatible fabrication

Metamaterial midinfrared absorber

Mid-IR detector array

Author

Mohammadamir Ghaderi

Chalmers, Microtechnology and Nanoscience (MC2), Electronics Material and Systems

Peter Enoksson

Chalmers, Microtechnology and Nanoscience (MC2), Electronics Material and Systems

Reinoud F. Wolffenbuttel

Delft University of Technology

2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII

Vol. June 2018 1580-1583 8808691
978-172812007-2 (ISBN)

20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII, TRANSDUCERS 2019 and EUROSENSORS XXXIII
Berlin, Germany,

Subject Categories

Accelerator Physics and Instrumentation

Embedded Systems

Other Electrical Engineering, Electronic Engineering, Information Engineering

DOI

10.1109/TRANSDUCERS.2019.8808691

More information

Latest update

7/29/2020