Interdiffusion in as-deposited Ni/Ti multilayer thin films analyzed by atom probe tomography
Artikel i vetenskaplig tidskrift, 2019

The nanoscale design of metallic multilayer thin films is one crucial factor that greatly influences the kinetics, often inducing unusual phase transformations. Metastable or amorphous phases may directly form in as-deposited films of certain thicknesses, which is common for Ni/Ti multilayers. Atom probe tomography and X-ray diffraction analyses are performed here to study the interdiffusion and structural changes as a function of the bilayer thickness in Ni/Ti multilayers. The films are deposited by DC magnetron sputtering with near 50:50 compositions. Multilayers with 5 nm bilayer thickness are found to be highly intermixed, with compositions up to ∼25 at.% for both diffuser metals, inducing amorphization reactions during deposition.

Diffusion

Thin films

Amorphous materials

Atom probe

Författare

Hisham Aboulfadl

Chalmers, Fysik, Materialens mikrostruktur

Universität des Saarlandes

Fabian Seifried

Karlsruher Institut für Technologie (KIT)

Michael Stüber

Karlsruher Institut für Technologie (KIT)

Frank Mücklich

Universität des Saarlandes

Materials Letters

0167-577X (ISSN)

Vol. 236 92-95

Ämneskategorier

Oorganisk kemi

Materialkemi

Den kondenserade materiens fysik

DOI

10.1016/j.matlet.2018.10.085

Mer information

Senast uppdaterat

2018-11-01