Making thick photoresist SU-8 flat on small substrates
Artikel i vetenskaplig tidskrift, 2019

This work suggests a simple method to flatten thick layers (similar to 50-200 mu m) of SU-8 photoresist on small substrates (similar to 1 cm). The method sidesteps the edge beads problem and enables photolithography patterns up to the substrates' edges. Moreover, the method can be used even for substrates with large aspect ratios when the spin coating is largely impossible.

edge beads

SU-8 uniformity

small substrates

Författare

Avgust Yurgens

Chalmers, Mikroteknologi och nanovetenskap (MC2), Kvantkomponentfysik

Journal of Micromechanics and Microengineering

0960-1317 (ISSN)

Vol. 29 1 017001

Ämneskategorier

Bearbetnings-, yt- och fogningsteknik

Annan fysik

Diskret matematik

DOI

10.1088/1361-6439/aaed1c

Mer information

Senast uppdaterat

2018-12-14