NANOSIL network of excellence - silicon based nanostructures and nanodevices for long-term nanoelectronics applications
Journal article, 2009
NANOSIL Network of Excellence [NANOSIL NoE web site
], funded by the European Commission in the 7th Framework Programme (ICT-FP7, no 216171), aims at European scale integration of the excellent European research laboratories and their capabilities in order to strengthen scientific and technological excellence in the field of nanoelectronic materials and devices for terascale integrated circuits (ICs), and to disseminating the results in a wide scientific and industrial community.
NANOSIL is exploring and assessing the science and technological aspects of nanodevices and operational regimes relevant to the n+4 technology node and beyond. It encompasses projects on nanoscale CMOS and beyond-CMOS. Innovative concepts, technologies and device architectures are proposed-with fabrication down to the finest features, and utilising a wide spectrum of advanced deposition and processing capabilities, extensive characterization and very rigorous device modeling. This work is carried out through a network of joint processing, characterization and modeling platforms. This critical interaction strengthens European integration in nanoelectronics and will speed up technological innovation for the nanoelectronics of the next two to three decades.
CMOS
Beyond-CMOS
Carbon electronics
Nanoelectronic structures
Nanodevices
Nanowires
Author
F Balestra
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
IMEP-FMNT
E Parker
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
The University of Warwick
D Leadley
The University of Warwick
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
S Mantl
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
Forschungszentrum Jülich
E. Dubois
IEMN Institut d'Electronique de Microelectronique et de Nanotechnologie
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
Olof Engström
Chalmers, Applied Physics, Physical Electronics
R Clerc
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
IMEP-FMNT
S Cristoloveanu
IMEP-FMNT
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
M.C. Lemme
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
RWTH Aachen University
J. P. Raskin
Universite catholique de Louvain
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
M.C. Lemme
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
A Ionesco
Swiss Federal Institute of Technology in Lausanne (EPFL)
K. E. Moselund
Swiss Federal Institute of Technology in Lausanne (EPFL)
K Boucart
Swiss Federal Institute of Technology in Lausanne (EPFL)
E Kasper
University of Stuttgart
A Karmous
University of Stuttgart
M Baus
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
B Spangenberg
RWTH Aachen University
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
Mikael Östling
Royal Institute of Technology (KTH)
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
E Sangiorgi
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
G Ghibaudo
IMEP-FMNT
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
D Flandre
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
Universite catholique de Louvain
Materials Science in Semiconductor Processing
1369-8001 (ISSN)
Vol. 11 5 148-159Subject Categories
Other Engineering and Technologies
DOI
10.1016/j.mssp.2008.09.017