Extending the validation of multi-mode model for anomalous transport to high beta poloidal tokamak scenario in DIII-D

Journal article, 2018

The Multi-Mode Model (MMM7.1) for anomalous transport is tested in predictive modeling of temperature profiles of a high beta poloidal DIII-D discharge. This new H-mode plasma regime, with high beta poloidal and high bootstrap currents, has been studied in DIII-D tokamak discharges [A. Garofalo et al., Nucl. Fusion 55, 123025 (2015)]. The role of instabilities that can drive the anomalous transport described by MMM7.1 is investigated. The temperature profiles for a high beta poloidal DIII-D discharge are computed using the NCLASS model for the neoclassical transport and the Weiland and Electron Temperature Gradient (ETG) components of the MMM7.1 model for the anomalous transport. The neoclassical transport is found to be the main contributor to the ion thermal transport in the plasma core. The contributions from the ion temperature gradient driven modes are found to be important only outside of the internal transport barrier. The magnitudes of the predicted temperature profiles are found to be in a reasonable agreement with experimental profiles. The simulation results approximately reproduce the internal transport barrier in the ion temperature profile but not in the electron temperature profile due to a weak dependence of the ETG driven transport on the Shafranov shift in the ETG component of MMM7.1. Possible effects that can contribute to stabilization of these modes, for example, effects associated with the large beta poloidal such as the Shafranov shift stabilization in the MMM7.1 model, are discussed. It is demonstrated that the E x B flow shear has a relatively small effect in the formation of the internal transport barrier in the high beta poloidal DIII-D discharge 154406. The Shafranov shift (alpha stabilization) and small or reversed magnetic shear profiles are found to be the primary reasons for quenched anomalous transport in this discharge. Published by AIP Publishing.