Surface potential influence on defect passivation kinetics probed by chromium gated metal-oxide-silicon devices

Journal article, 1999

In this study we present a new scheme for obtaining information on the passivation mechanisms of as-grown Si-SiO2 interface defects by resolving the effects of bias on the defect passivation reaction. This is possible when using chromium gated metal-oxide-silicon devices for which the effect of non-biased passivation is very small compared to devices with for example aluminum gates. It is shown that a negative surface potential promotes the passivation of interface states while a positive surface potential reduces it.