Reduced Graphene Oxide Nanostructures by Light: Going Beyond the Diffraction Limit
Journal article, 2018

Graphene oxide (GO) offers excellent possibilities that are recently demonstrated in many applications ranging from biological sensors to optoelectronic devices. The process of thermal annealing aids in removing the oxygen-containing groups in GO, making GO more graphene-like, or the so-called reduced graphene oxide (rGO). Thermal reduction can also be achieved by intense light. Here, we demonstrate a scalable, inexpensive, and environmentally friendly method to pattern graphene oxide films beyond the diffraction limit of light using a conventional laser. We show that contrary to previous reports, non-linear effects that occur under high intensity conditions of laser irradiation allow the fabrication of highly conductive carbon nanowires with dimensions much smaller than the laser spot size. The potential of this method is illustrated by the fabrication of several devices on flexible and transparent substrates, including hybrid plasmonic/rGO sensors.

graphene

Author

Raul D. Rodriguez

Tomsk Polytechnic University

Ma Bing

Tomsk Polytechnic University

Alexey Ruban

Tomsk Polytechnic University

Munis Khan

Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics

Ammar Al Hamry

Technische Universität Chemnitz

Zoheb Khan

Technische Universität Chemnitz

Journal of Physics: Conference Series

17426588 (ISSN) 17426596 (eISSN)

Vol. 1098

Subject Categories

Astronomy, Astrophysics and Cosmology

Atom and Molecular Physics and Optics

Fluid Mechanics and Acoustics

DOI

10.1088/1742-6596/1092/1/012124

More information

Created

2/22/2022