Rutile TiO2 thin films grown by reactive high power impulse magnetron sputtering
Journal article, 2013
High power impulse magnetron sputtering
Thin film growth
Reactive sputtering
Titanium dioxide
Magnetron sputtering
Optical properties
Author
Björn Agnarsson
University of Iceland
Chalmers, Applied Physics, Biological Physics
Fridrik Magnus
University of Iceland
Uppsala University
T. K. Tryggvason
University of Iceland
A. S. Ingason
Linköping University
University of Iceland
K. Leosson
University of Iceland
S. Olafsson
University of Iceland
J. T. Gudmundsson
University of Iceland
Shanghai Jiao Tong University
Thin Solid Films
0040-6090 (ISSN)
Vol. 545 445-450Subject Categories
Inorganic Chemistry
Materials Chemistry
Condensed Matter Physics
DOI
10.1016/j.tsf.2013.07.058