Scaling nanoribbon transistors with monolayer transition metal dichalcogenides
Journal article, 2026

Nanoscale transistors demand aggressive scaling of all channel dimensions-length, width and thickness. Two-dimensional semiconductors (2DS) provide the ultimate thickness limit, yet good device performance has largely remained restricted to micrometre-wide channels. Here we report monolayer 2DS nanoribbon transistors with both n- and p-type operation, fabricated by a top-down multipatterning process that includes 'anchored' contacts to limit nanoribbon delamination. This approach achieves channel lengths and widths down to 25-30 nm, with minimal edge degradation confirmed through nanoscale characterization, including tip-enhanced photoluminescence. Integrated with thin high-kappa gate dielectrics, the devices deliver on-state currents up to 560, 420 and 130 & micro;A & micro;m-1 at a drain-to-source voltage of 1 V for n-type MoS2, n-type WS2 and p-type WSe2, respectively. These results exceed prior single-gated 2DS nanoribbon reports, with WS2 improving by more than two orders of magnitude, even for normally off (enhancement-mode) operation. Overall, these findings position top-down patterned 2DS nanoribbons as promising building blocks for future nanosheet transistor architectures.

Author

Tara Pena

Stanford University

Anton Persson

Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics

Andrey Krayev

HORIBA

Ashildur Fridriksdottir

Stanford University

Haotian Su

Stanford University

Yuan-Mau Lee

Stanford University

Young Suh Song

Stanford University

Kathryn Neilson

Stanford University

Zhepeng Zhang

Stanford University

Anh Tuan Hoang

Stanford University

Jerry A. Yang

Stanford University

Lauren Hoang

Stanford University

Shan X. Wang

Stanford University

Andrew J. Mannix

Stanford University

Paul C. McIntyre

SLAC National Accelerator Laboratory

Stanford University

Eric Pop

SLAC National Accelerator Laboratory

Stanford University

Nature Nanotechnology

1748-3387 (ISSN) 1748-3395 (eISSN)

Vol. In Press

Subject Categories (SSIF 2025)

Condensed Matter Physics

DOI

10.1038/s41565-026-02161-w

PubMed

42230814

More information

Latest update

6/11/2026