Patterned Substrate Epitaxy
Book chapter, 2012

In this chapter, we provide a brief overview of patterned substrate epitaxy (PSE) with intention to improve material quality of lattice mismatched thin films. We describe a short history, mechanisms of strain relaxation in diamond and zincblende heterostructures with small lattice mismatch when grown on large size blanket substrates and on patterned substrates, and implementation techniques.

Author

Huan Zhao Ternehäll

Chalmers, Microtechnology and Nanoscience (MC2), Terahertz and Millimetre Wave Laboratory

Other publications Research

Shu Min Wang

Chalmers, Microtechnology and Nanoscience (MC2), Photonics

Other publications Research

Lattice Engineering Technology and Applications

396-

Areas of Advance

Information and Communication Technology

Nanoscience and Nanotechnology (2010-2017)

Materials Science

Subject Categories

Materials Engineering

Electrical Engineering, Electronic Engineering, Information Engineering

Nano Technology

DOI

10.4032/9789814364256

Publication data connected to DOI

More information

Latest update

12/17/2018

Feedback and support

If you have questions, need help, find a bug or just want to give us feedback you may use this form, or contact us per e-mail research.lib@chalmers.se or by phone 46 (0)31-772 3744.

About

Research.chalmers.se contains research information from Chalmers University of Technology, Sweden. It includes information on projects, publications, research funders and collaborations.

More about coverage period and what is publicly available

Privacy and cookies

Links

Chalmers Library
Chalmers Research
Research projects at chalmers.se

Chalmers University of Technology

SE-412 96 GOTHENBURG, SWEDEN
PHONE: +46 (0)31-772 10 00
WWW.CHALMERS.SE