In situ x-ray photoelectron spectroscopy studies of water on metals and oxides at ambient conditions
Journal article, 2008

X-ray photoelectron spectroscopy (XPS) is a powerful tool for surface and interface analysis, providing the elemental composition of surfaces and the local chemical environment of adsorbed species. Conventional XPS experiments have been limited to ultrahigh vacuum (UHV) conditions due to a short mean free path of electrons in a gas phase. The recent advances in instrumentation coupled with third-generation synchrotron radiation sources enables in situ XPS measurements at pressures above 5Torr. In this paper, we describe the basic design of the ambient pressure XPS setup that combines differential pumping with an electrostatic focusing. We present examples of the application of in situ XPS to studies of water adsorption on the surface of metals and oxides including Cu(110), Cu(111), TiO2(110) under environmental conditions of water vapor pressure. On all these surfaces we observe a general trend where hydroxyl groups form first, followed by molecular water adsorption. The importance of surface OH groups and their hydrogen bonding to water molecules in water adsorption on surfaces is discussed in detail.

Author

S. Yamamoto

Stanford Synchrotron Radiation Laboratory

H. Bluhm

Lawrence Berkeley National Laboratory

K. Andersson

Technical University of Denmark (DTU)

Stockholm University

Stanford Synchrotron Radiation Laboratory

Guido Ketteler

Chalmers, Applied Physics

H. Ogasawara

Stanford Synchrotron Radiation Laboratory

M. Salmeron

University of California

Lawrence Berkeley National Laboratory

A. Nilsson

Stockholm University

Stanford Synchrotron Radiation Laboratory

Journal of Physics Condensed Matter

0953-8984 (ISSN)

Vol. 20 18 184025

Subject Categories

Condensed Matter Physics

DOI

10.1088/0953-8984/20/18/184025

More information

Latest update

4/20/2018