The formation and characterisation of lanthanum oxide based Si/High-k/NiSi gate stacks by electron beam evaporation: An examination of in-situ amorphous silicon capping and NiSi formation
Journal article, 2007


P.K. Hurley

M. Pijolat

K. Cherkaoui

E. O'Connor

D. O'Donnel

M.A. Negara

M.C. Lemme

H.D.B. Gottlob

M Schmidt

K. Stegmaier

U. Schwalke

S. Hall

O Buiu

Olof Engström

Chalmers, Microtechnology and Nanoscience (MC2)

S.B. Newcomb

ECS Transactions

Vol. 11 4 145-

Subject Categories

Other Engineering and Technologies

More information