Interface state properties of high-k/SiOx/Si interfaces portrayed by multiparameter admittance spectroscopy
Paper in proceeding, 2010
Author
Bahman Raeissi
Chalmers, Applied Physics, Physical Electronics
T Gutt
H. D. B. Gottlob
H.M. Przewlocki
Olof Engström
Chalmers, Applied Physics, Physical Electronics
Proceedings of the 16th Workshop on Dielectrics in Microelectronics, p. 103, Bratislava, June 28 - 30 2010
Subject Categories
Other Engineering and Technologies not elsewhere specified