Interface state properties of high-k/SiOx/Si interfaces portrayed by multiparameter admittance spectroscopy
Paper in proceedings, 2010

Author

Bahman Raeissi

Chalmers, Applied Physics, Physical Electronics

T Gutt

H. D. B. Gottlob

H.M. Przewlocki

Olof Engström

Chalmers, Applied Physics, Physical Electronics

Proceedings of the 16th Workshop on Dielectrics in Microelectronics, p. 103, Bratislava, June 28 - 30 2010

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Other Engineering and Technologies not elsewhere specified

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10/8/2017