Gate stacks
Book chapter, 2010

Metal gate

MOSFETs

AlN buffer layer

Gate stacks

GdSiO/LaSiO

Author

Olof Engström

Chalmers, Applied Physics, Physical Electronics

I. Z. Mitrovic

University of Liverpool

S. Hall

University of Liverpool

Bahman Raeissi

Tyndall National Institute at National University of Ireland, Cork

K. Cherkaoui

Tyndall National Institute at National University of Ireland, Cork

S Monaghan

Tyndall National Institute at National University of Ireland, Cork

H. D. B. Gottlob

Gesellschaft fur Angewandte Mikro- und Optoelektronik mbH

M.C. Lemme

Harvard University

Nanoscale CMOS: Innovative Materials, Modeling and Characterization

23 - 67

Areas of Advance

Information and Communication Technology

Nanoscience and Nanotechnology (2010-2017)

Subject Categories

Other Electrical Engineering, Electronic Engineering, Information Engineering

DOI

10.1002/9781118621523.ch2

ISBN

978-184821180-3

More information

Latest update

2/28/2018