Gate stacks
Book chapter, 2013
AlN buffer layer
GdSiO/LaSiO
MOSFETs
Metal gate
Gate stacks
Author
Olof Engström
Chalmers, Microtechnology and Nanoscience (MC2), Terahertz and Millimetre Wave Laboratory
I. Z. Mitrovic
University of Liverpool
S. Hall
University of Liverpool
Bahman Raeissi
Tyndall National Institute at National University of Ireland, Cork
K. Cherkaoui
Tyndall National Institute at National University of Ireland, Cork
S Monaghan
Tyndall National Institute at National University of Ireland, Cork
H. D. B. Gottlob
Gesellschaft fur Angewandte Mikro- und Optoelektronik mbH
M.C. Lemme
Harvard University
Nanoscale CMOS: Innovative Materials, Modeling and Characterization
23 - 67
Areas of Advance
Information and Communication Technology
Nanoscience and Nanotechnology
Subject Categories
Other Electrical Engineering, Electronic Engineering, Information Engineering
DOI
10.1002/9781118621523.ch2