Patterned Substrate Epitaxy
Book chapter, 2012
In this chapter, we provide a brief overview of patterned substrate epitaxy (PSE) with intention to improve material quality of lattice mismatched thin films. We describe a short history, mechanisms of strain relaxation in diamond and zincblende heterostructures with small lattice mismatch when grown on large size blanket substrates and on patterned substrates, and implementation techniques.
Author
Huan Zhao Ternehäll
Chalmers, Microtechnology and Nanoscience (MC2), Terahertz and Millimetre Wave Laboratory
Shu Min Wang
Chalmers, Microtechnology and Nanoscience (MC2), Photonics
Lattice Engineering Technology and Applications
396-
Areas of Advance
Information and Communication Technology
Nanoscience and Nanotechnology
Materials Science
Subject Categories
Materials Engineering
Electrical Engineering, Electronic Engineering, Information Engineering
Nano Technology
DOI
10.4032/9789814364256