Patterned Substrate Epitaxy
Book chapter, 2012

In this chapter, we provide a brief overview of patterned substrate epitaxy (PSE) with intention to improve material quality of lattice mismatched thin films. We describe a short history, mechanisms of strain relaxation in diamond and zincblende heterostructures with small lattice mismatch when grown on large size blanket substrates and on patterned substrates, and implementation techniques.

Author

Huan Zhao Ternehäll

Chalmers, Microtechnology and Nanoscience (MC2), Terahertz and Millimetre Wave Laboratory

Shu Min Wang

Chalmers, Microtechnology and Nanoscience (MC2), Photonics

Lattice Engineering Technology and Applications

396-

Areas of Advance

Information and Communication Technology

Nanoscience and Nanotechnology (2010-2017)

Materials Science

Subject Categories

Materials Engineering

Electrical Engineering, Electronic Engineering, Information Engineering

Nano Technology

DOI

10.4032/9789814364256

More information

Latest update

12/17/2018