Deposition of high quality thin dielectrics on silicon
Licentiate thesis, 1996
oxynitride
metal-oxide-semiconductor capacitors
RPECVD
silicon dioxide
interfaces
si-SiO2
remote plasma-enhanced CVD
ONO
C-V
nitrided interfaces
SiO2
deposited dielectrics
Author
Lars-Åke Ragnarsson
Department of Solid State Electronics
Subject Categories
Other Electrical Engineering, Electronic Engineering, Information Engineering
ISBN
91-7197-396-6
Technical report L - School of Electrical and Computer Engineering, Chalmers University of Technology. : 244