Ultrathin gate oxides for future SiGe CMOS devices
Licentiate thesis, 2001

gate oxide

ultrathin

C-V

SiGe

valence band offset

Author

Alok Sareen

Department of Microelectronics

Subject Categories

Other Electrical Engineering, Electronic Engineering, Information Engineering

Technical report L - School of Electrical and Computer Engineering, Chalmers University of Technology. : 417

More information

Created

10/7/2017