Mechanism for Limiting Thickness of Thin Oxide Films on Aluminum
Journal article, 2014
Author
J. D. Baran
Henrik Grönbeck
Chalmers, Applied Physics, Chemical Physics
Competence Centre for Catalysis (KCK)
Anders Hellman
Chalmers, Applied Physics, Chemical Physics
Competence Centre for Catalysis (KCK)
Physical Review Letters
0031-9007 (ISSN) 1079-7114 (eISSN)
Vol. 112 14 146103Areas of Advance
Nanoscience and Nanotechnology
Transport
Energy
Materials Science
Subject Categories
Physical Sciences
Infrastructure
C3SE (Chalmers Centre for Computational Science and Engineering)
DOI
10.1103/PhysRevLett.112.146103