Dynamic laser speckle as a detrimental phenomenon in optical projection lithography
Journal article, 2006

excimer lasers

illuminator intensity distribution

dose control

line edge roughness

partially coherent optical field

microlens arrays

optical projection lithography

illumination conditions

spectral linewidth

dynamic laser speckle

Author

Christer Rydberg

Chalmers, Microtechnology and Nanoscience (MC2), Photonics

Other publications Research

Jörgen Bengtsson

Chalmers, Microtechnology and Nanoscience (MC2), Photonics

Other publications Research

Torbjörn Sandström

Journal of Microlithography, Microfabrication and Microsystems

1537-1646 (ISSN)

Vol. 5 3 33004-1-8-

Subject Categories

Telecommunications

Atom and Molecular Physics and Optics

More information

Created

10/6/2017

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