Dynamic laser speckle as a detrimental phenomenon in optical projection lithography
Artikel i vetenskaplig tidskrift, 2006
excimer lasers
illuminator intensity distribution
dose control
line edge roughness
partially coherent optical field
microlens arrays
optical projection lithography
illumination conditions
spectral linewidth
dynamic laser speckle
Författare
[Person f49d2506-c49a-459c-8333-d2beff653f76 not found]
[Person 7e8a04ba-10f1-4c35-b93d-bcade3aa346f not found]
[Person f8e41c1f-e586-4f08-b2c8-e48714318bfb not found]
Journal of Microlithography, Microfabrication and Microsystems
1537-1646 (ISSN)
Vol. 5 3 33004-1-8-Ämneskategorier (SSIF 2011)
Telekommunikation
Atom- och molekylfysik och optik