Proximity effect correction for 20nm dimension patterning
Paper in proceeding, 2009

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Author

D. Tsunoda

NIPPON CONTROL SYSTEM Corporation

M. Shoji

NIPPON CONTROL SYSTEM Corporation

Mitsuko Tatsugawa

NIPPON CONTROL SYSTEM Corporation

H. Tsunoe

NIPPON CONTROL SYSTEM Corporation

Yusuke Iino

NIPPON CONTROL SYSTEM Corporation

Piotr Jedrasik

Chalmers, Microtechnology and Nanoscience (MC2), Nanofabrication Laboratory

Published in

Proceedings of SPIE - The International Society for Optical Engineering

0277786X (ISSN) 1996756X (eISSN)

Vol. 7271 art. no 72712S
978-081947524-4 (ISBN)

Categorizing

Subject Categories (SSIF 2011)

Nano Technology

Identifiers

DOI

10.1117/12.813971

ISBN

978-081947524-4

More information

Created

12/27/2017