Piotr Jedrasik

Researcher at Chalmers, Microtechnology and Nanoscience (MC2), Nanofabrication Laboratory

Nano-processing

Source: chalmers.se

Showing 22 publications

2013

Sub-10 nm resolution after lift-off using HSQ./PMMA double layer resist

Marcus Rommel, Bengt Nilsson, Piotr Jedrasik et al
Microelectronic Engineering. Vol. 110, p. 123-125
Journal article
2012

Vertical single nanowire devices based on conducting polymers

A. Vlad, C. A. Dutu, Piotr Jedrasik et al
Nanotechnology. Vol. 23 (2)
Journal article
2012

Adjustment of self-heating in long superconducting thin film NbN microbridges

A. Stockhausen, K. Il'in, M. Siegel et al
Superconductor Science and Technology. Vol. 25 (3)
Journal article
2011

Technological and Material Related Challenges for Large Area, High Aspect-Ratio, Near Teradot/Inch(2) Areal Density and Three-Dimensional Structuring of Polyaniline

Piotr Jedrasik, A. Vlad, Ulf Södervall
Journal of Nanoscience and Nanotechnology. Vol. 11 (10), p. 8924-8935
Journal article
2010

Proximity effects correction for sub-10nm patterning node

Piotr Jedrasik, D. Tsunoda, M. Shoji et al
Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7638
Paper in proceedings
2010

Hybrid synthesis and processing schemes for highly-ordered polyaniline nanoarchitectures

A. Vlad, Piotr Jedrasik, C. A. Dutu et al
INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings, p. 429-430
Conference contribution
2009

Highly Ordered Conjugated Polymer Nanoarchitectures with Three-Dimensional Structural Control

A. Vlad, C. A. Dutu, P. Guillet et al
Nano Letters. Vol. 9 (8), p. 2838-2843
Journal article
2009

Proximity effect correction for 20nm dimension patterning

D. Tsunoda, M. Shoji, Mitsuko Tatsugawa et al
Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7271
Paper in proceedings
2007

Field-effect transistors with thin ZnO as active layer for gas sensor applications

F. V. Farmakis, T. Speliotis, K. P. Alexandrou et al
Microelectronic Engineering. Vol. 85 (5-6), p. 1035-1038
Paper in proceedings
2007

Mode and polarization control in VCSELs using shallow surface structures

Johan Gustavsson, Åsa Haglund, Emma Söderberg et al
IET Optoelectronics. Vol. 1 (5), p. 197-205
Journal article
2006

Design and evaluation of fundamental mode and polarization stabilized VCSELs with a sub-wavelength surface grating

Åsa Haglund, Johan Gustavsson, Jörgen Bengtsson et al
IEEE Journal of Quantum Electronics. Vol. 42 (3), p. 231-240
Journal article
2005

Efficient and individually controllable mechanisms for mode and polarization selection in VCSELs, based on a common, localized, sub-wavelength surface grating

Johan Gustavsson, Åsa Haglund, Josip Vukusic et al
Optics Express. Vol. 13 (17), p. 6626-6634
Journal article
2005

High-power fundamental-mode and polarization stabilized VCSELs using a sub-wavelength surface grating

Åsa Haglund, Johan Gustavsson, Josip Vukusic et al
Electronics Letters. Vol. 41 (14), p. 37-38
Journal article
2005

Sub-Wavelength Surface Grating Application for High-Power Fundamental-Mode and Polarization Stabilization of the VCSELs

Åsa Haglund, Piotr Jedrasik, Johan Gustavsson et al
IEEE ETFA 2005, pp.
Paper in proceedings
2005

High-power single-mode and polarization stabilized VCSELs using a sub-wavelength surface grating

Åsa Haglund, Johan Gustavsson, Josip Vukusic et al
Conference on Lasers and Electrooptics (CLEO) Europe, Munich
Paper in proceedings
2005

Experimental Study of the Combined Mode and Polarization Control in VCSELs with a Sub-Wavelength Surface Grating

Åsa Haglund, Johan Gustavsson, Piotr Jedrasik et al
Annual Lasers and Electro Optics Society Meeting, Sydney
Paper in proceedings
2004

HSQ application for sub-10nm scale lithography.

Piotr Jedrasik
Nano and Giga Challenges in Microelectronics, proceedings
Conference contribution
2003

Application of flowable oxide ( FOx-12 ) for sub-10 nanometer scale fabrication

Piotr Jedrasik
29th Micro- and Nano-Engineering, proceedings
Paper in proceedings
2003

Dual pass electron beam writing of bit arrays with sub-100 nm bits on imprint lithography masters for patterned media production

Alex Bogdanov, Tommy Holmqvist, Piotr Jedrasik et al
Microelectronic Engineering. Vol. 67-68, p. 381-389
Paper in proceedings
2002

Application of flowable oxide ( FOx-12 ) for nanometer magnetic particle fabrication.

Piotr Jedrasik, May Hanson
Microelectronic Engineering. Vol. 61-62 (2002), p. 811-817
Journal article
2000

Application of calixarene for nanometer magnetic particle fabrication

Piotr Jedrasik, Maj Hanson, Bengt Nilsson
Microelectronic Engineering. Vol. 53, p. 497-500
Paper in proceedings
2000

Application of calixarene for nanometer magnetic particle fabrication.

Piotr Jedrasik, May Hanson
Microelectronic Engineering. Vol. 53 (2000), p. 497-500
Journal article

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