Sub-10 nm resolution after lift-off using HSQ./PMMA double layer resist
Journal article, 2013
Electron beam lithography
HSQJPMMA double layer resist
Sub-10 nm resolution
HF free lift-off
Plasmonics
Author
Marcus Rommel
Max Planck Society
Bengt Nilsson
Chalmers, Microtechnology and Nanoscience (MC2), Nanofabrication Laboratory
Piotr Jedrasik
Chalmers, Microtechnology and Nanoscience (MC2), Nanofabrication Laboratory
Valentina Bonanni
Chalmers, Applied Physics, Bionanophotonics
Alexander Dmitriev
Chalmers, Applied Physics, Bionanophotonics
Juergen Weis
Max Planck Society
Published in
Microelectronic Engineering
0167-9317 (ISSN)
Vol. 110 p. 123-125Categorizing
Subject Categories (SSIF 2011)
Nano Technology
Identifiers
DOI
10.1016/j.mee.2013.02.101