Application of calixarene for nanometer magnetic particle fabrication
Paper in proceeding, 2000
An application of the negative tone electron beam resist Calixarene for fabrication of nanometer magnetic particles is reported. Thorough resist characterisation is performed. Proximity tests for characterization of the intraproximity behaviour of the resist on the tested substrate is investigated to compensate for modulation of lateral dimensions due to electron scattering. Magnetic particles were fabricated by a combination of EBL and ion beam milling using Calixarene as a transfer layer down to Fe. We fabricated arrays of circular particles with characteristic dimensions down to 40 nm. Initial results of topographic and magnetic force microscopy are reported
ferromagnetic materials
sputter etching
magnetic particles
iron
electron resists
magnetic force microscopy
atomic force microscopy
proximity effect (lithography)
nanotechnology
particle size
nanostructured materials
arrays
surface topography
Author
Piotr Jedrasik
Department of Microelectronics and Nanoscience
Maj Hanson
Chalmers, Department of Experimental Physics, Solid State Physics
Bengt Nilsson
Department of Microelectronics and Nanoscience
Microelectronic Engineering
0167-9317 (ISSN)
Vol. 53 497-500Areas of Advance
Nanoscience and Nanotechnology
Materials Science
Subject Categories
Condensed Matter Physics
DOI
10.1016/S0167-9317(00)00364-6