Application of calixarene for nanometer magnetic particle fabrication
Paper i proceeding, 2000
An application of the negative tone electron beam resist Calixarene for fabrication of nanometer magnetic particles is reported. Thorough resist characterisation is performed. Proximity tests for characterization of the intraproximity behaviour of the resist on the tested substrate is investigated to compensate for modulation of lateral dimensions due to electron scattering. Magnetic particles were fabricated by a combination of EBL and ion beam milling using Calixarene as a transfer layer down to Fe. We fabricated arrays of circular particles with characteristic dimensions down to 40 nm. Initial results of topographic and magnetic force microscopy are reported
ferromagnetic materials
sputter etching
magnetic particles
iron
electron resists
magnetic force microscopy
atomic force microscopy
proximity effect (lithography)
nanotechnology
particle size
nanostructured materials
arrays
surface topography
Författare
Piotr Jedrasik
Institutionen för mikroelektronik och nanovetenskap
Maj Hanson
Chalmers, Institutionen för experimentell fysik, Fasta tillståndets fysik
Bengt Nilsson
Institutionen för mikroelektronik och nanovetenskap
Microelectronic Engineering
0167-9317 (ISSN)
Vol. 53 497-500Styrkeområden
Nanovetenskap och nanoteknik
Materialvetenskap
Ämneskategorier
Den kondenserade materiens fysik
DOI
10.1016/S0167-9317(00)00364-6