Ferroelectric thin films: Review of materials, properties, and applications
Journal article, 2006
Author
Nava Setter
Swiss Federal Institute of Technology in Lausanne (EPFL)
D. Damjanovic
Swiss Federal Institute of Technology in Lausanne (EPFL)
L. Eng
Technische Universität Dresden
G. Fox
Ramtron International Corporation
Spartak Gevorgian
Chalmers, Microtechnology and Nanoscience (MC2), Microwave and Terahertz Technology
S. Hong
Samsung
A. Kingon
North Carolina State University
H. Kohlstedt
Forschungszentrum Jülich
University of California
N. Y. Park
Samsung
G. B. Stephenson
Argonne National Laboratory
I. Stolitchnov
Swiss Federal Institute of Technology in Lausanne (EPFL)
A. K. Taganstev
Swiss Federal Institute of Technology in Lausanne (EPFL)
D. V. Taylor
Nanosys, Inc.
Swiss Federal Institute of Technology in Lausanne (EPFL)
T. Yamada
Swiss Federal Institute of Technology in Lausanne (EPFL)
S. Streiffer
Argonne National Laboratory
Journal of Applied Physics
0021-8979 (ISSN) 1089-7550 (eISSN)
Vol. 100 5 051606-1-46- 051606Subject Categories
Condensed Matter Physics
DOI
10.1063/1.2336999