Towards Oxide Electronics: a Roadmap
Journal article, 2019
Oxide science and technology has been the target of a wide four-year project, named Towards Oxide-Based Electronics (TO-BE), that has been recently running in Europe and has involved as participants several hundred scientists from 29 EU countries. In this review and perspective paper, published as a final deliverable of the TO-BE Action, the opportunities of oxides as future electronic materials for Information and Communication Technologies ICT and Energy are discussed. The paper is organized as a set of contributions, all selected and ordered as individual building blocks of a wider general scheme. After a brief preface by the editors and an introductory contribution, two sections follow. The first is mainly devoted to providing a perspective on the latest theoretical and experimental methods that are employed to investigate oxides and to produce oxide-based films, heterostructures and devices. In the second, all contributions are dedicated to different specific fields of applications of oxide thin films and heterostructures, in sectors as data storage and computing, optics and plasmonics, magnonics, energy conversion and harvesting, and power electronics.
Author
M. Coll
Spanish National Research Council (CSIC)
J. Fontcuberta
Spanish National Research Council (CSIC)
M. Althammer
Walther-Meissner-Institute for Low Temperature Research
Technical University of Munich
M. Bibes
Thales Group
H. Boschker
Max Planck Society
A. Calleja
Oxolutia S.L
G. Cheng
Pittsburgh Quantum Institute
University of Science and Technology of China
University of Pittsburgh
M. Cuoco
University of Salerno
R. Dittmann
Jülich Research Centre
B. Dkhil
Laboratoire Structures, Propriétés et Modélisation des Solides
I. El Baggari
Cornell University
M. Fanciulli
University of Milano-Bicocca
I. Fina
Spanish National Research Council (CSIC)
E. Fortunato
Nova University of Lisbon
CEMOP/UNINOVA
C. Frontera
Spanish National Research Council (CSIC)
S. Fujita
Kyoto University
V. Garcia
Thales Group
S. T.B. Goennenwein
Technische Universität Dresden
C. G. Granqvist
Uppsala University
J. Grollier
Thales Group
R. Gross
Technical University of Munich
Walther-Meissner-Institute for Low Temperature Research
Nanosystems Initiative Munich (NIM)
A. Hagfeldt
Swiss Federal Institute of Technology in Lausanne (EPFL)
G. Herranz
Spanish National Research Council (CSIC)
K. Hono
National Institute for Materials Science (NIMS)
E. Houwman
MESA Institute for Nanotechnology
M. Huijben
MESA Institute for Nanotechnology
Alexei Kalaboukhov
Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics
D. J. Keeble
University of Dundee
G. Koster
MESA Institute for Nanotechnology
L. F. Kourkoutis
Cornell University
Kavli Institute at Cornell for Nanoscale Science
J. Levy
Pittsburgh Quantum Institute
University of Pittsburgh
M. Lira-Cantu
Institut Catala de Nanociencia i Nanotecnologia
J. L. MacManus-Driscoll
University of Cambridge
Jochen Mannhart
Max Planck Society
R. Martins
University of Milano-Bicocca
Consiglo Nazionale Delle Richerche
S. Menzel
Pittsburgh Quantum Institute
T. Mikolajick
NaMLab GGmbH
Technische Universität Dresden
M. Napari
University of Cambridge
M. D. Nguyen
MESA Institute for Nanotechnology
G. A. Niklasson
Uppsala University
C. Paillard
University of Arkansas System
S. Panigrahi
CEMOP/UNINOVA
Nova University of Lisbon
G. Rijnders
MESA Institute for Nanotechnology
F. Sánchez
Spanish National Research Council (CSIC)
P. Sanchis
Polytechnic University of Valencia (UPV)
S. Sanna
Technical University of Denmark (DTU)
D. G. Schlom
Cornell University
U. Schroeder
NaMLab GGmbH
K. M. Shen
Cornell University
Kavli Institute at Cornell for Nanoscale Science
A. Siemon
RWTH Aachen University
Matjaz Spreitzer
Jozef Stefan Institute
H. Sukegawa
National Institute for Materials Science (NIMS)
R. Tamayo
Oxolutia S.L
J. van den Brink
Leibniz Institute for Solid State and Materials Research Dresedn
N. Pryds
Technical University of Denmark (DTU)
F. Miletto Granozio
Superconductors, oxides and other innovative materials and devices
Applied Surface Science
0169-4332 (ISSN)
Vol. 482 1-93Subject Categories (SSIF 2011)
Materials Chemistry
Nano Technology
Condensed Matter Physics
DOI
10.1016/j.apsusc.2019.03.312