Electron Microscopy Investigation of Detailed Microstructures of CVD TiAlN and TiN Coatings - Effects of Gas Flow and Substrate on Coating Microstructure
Licentiate thesis, 2020
Depositing homogeneous TiAlN coatings on cutting tool inserts to achieve extraordinary mechanical performance and good chemical stability remains a challenging task. In this work, the detailed microstructure of high-Al cubic Ti1-xAlxN coatings (average x = 0.8) made by LPCVD was studied by state-of-the-art electron microscopy. A periodic structure with Ti-rich and Al-rich nanolamellae was found. Ti enrichment appears at high gas flow rate, which is suggested to be due to the increase of mass transport of certain reactants. However, the higher mass transport does not influence the Al-deposition much, as it is mainly limited by surface kinetics. A co-growth of h-AlN and TiAlN was investigated by electron microscopy, which showed that the h-AlN prefers to form on the Ti-rich cubic phase following a specific crystallographic orientation relationship: [1 1 0]cub // [2 -1 -1 0]hex, and (0 0 1)cub // (0 0 0 1)hex. This can be explained by a low interface energy between the h-AlN and Ti-rich cubic phase according to density functional theory (DFT) modelling. The microstructural inhomogeneity of TiAlN coatings can therefore be explained by the co-growth of the h-AlN phase with the Ti-rich cubic phase, which is caused by a fast gas flow.
An electron microscopy study was done on the microstructure of TiN coatings grown on a CoCrFeNi MPEA substrate. The MPEA shows a good capability of serving as a CVD substrate. No severe etching of the substrate was found, and the growth of TiN was not disturbed by the substrate material. However, grain boundary diffusion of Cr into the TiN coating was revealed by analytical electron microscopy.
Chalmers, Physics, Microstructure Physics
Effects of gas flow on detailed microstructure inhomogeneities in LPCVD TiAlN nanolamella coatings
Materialia,; Vol. 9(2020)
Chemical Vapor Deposition of TiN on a CoCrFeNi multi-principal element alloy substrate.Katalin Böör, Ren Qiu, Axel Forslund, Olof Bäcke, Henrik Larsson, Erik Lindahl, Mats Halvarsson, Mats Boman, and Linus von Fieandt.Under review of Surface and Coatings Technology.
CVD 2.0 - En ny generation av hårda beläggningar
Swedish Foundation for Strategic Research (SSF), 2016-05-01 -- 2021-06-30.
Manufacturing, Surface and Joining Technology
Other Materials Engineering
Chalmers Materials Analysis Laboratory
Areas of Advance
Chalmers University of Technology
PJ lecture hall, Fysik Origo Building, Fysikgården 2B
Opponent: Professor Magnus Odén Department of Physics, Chemistry and Biology Linköping University, Sweden