Dry film photoresist-based microfabrication: a new method to fabricate millimeter-wave waveguide components
Journal article, 2021
MEMS
dry film photoresist
THz
gap waveguide
microfabrication
Author
Sadia Farjana
Chalmers, Microtechnology and Nanoscience (MC2), Electronics Material and Systems
Mohammadamir Ghaderi
Chalmers, Microtechnology and Nanoscience (MC2), Electronics Material and Systems
Sofia Rahiminejad
Chalmers, Microtechnology and Nanoscience (MC2), Electronics Material and Systems
Jet Propulsion Laboratory, California Institute of Technology
Sjoerd Haasl
RISE Research Institutes of Sweden
Peter Enoksson
Enoaviatech AB
Chalmers, Microtechnology and Nanoscience (MC2), Electronics Material and Systems
Micromachines
2072666x (eISSN)
Vol. 12 3 1-13 260Areas of Advance
Nanoscience and Nanotechnology
Subject Categories
Other Engineering and Technologies not elsewhere specified
Nano Technology
Infrastructure
Nanofabrication Laboratory
DOI
10.3390/mi12030260