Characterization Techniques for Thin and Thick Ferroelectric Films
Journal article, 2007

A few measurement techniques are presented for characterization of thin and thick ferroelectric films at microwave frequencies. Broadband reflection type measurements using a probe station are considered for on wafer characterization of thin films. The accuracy of the method is analyzed with respect to measurement residual systematic errors. A test structure is introduced allowing quick and accurate extraction of the film parameters based on the rigorous full-wave model. Two measurement techniques are reported for electrode-less characterization of thick ferroelectric films. The first method (X-band) is based on the reflection type measurement of a resonator established by a layered alumina/ferroelectric sample loaded in a cut-off waveguide. The second method (B-band) utilizes an open resonator (OR) technique. Theoretical and experimental results are presented.



dielectric properties



Anatoli Deleniv

Chalmers, Applied Physics, Physical Electronics

Journal of the European Ceramic Society

0955-2219 (ISSN)

Vol. 27 8-9 2759-2764

Subject Categories

Other Materials Engineering

Other Electrical Engineering, Electronic Engineering, Information Engineering



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