Characterization Techniques for Thin and Thick Ferroelectric Films
Artikel i vetenskaplig tidskrift, 2007

A few measurement techniques are presented for characterization of thin and thick ferroelectric films at microwave frequencies. Broadband reflection type measurements using a probe station are considered for on wafer characterization of thin films. The accuracy of the method is analyzed with respect to measurement residual systematic errors. A test structure is introduced allowing quick and accurate extraction of the film parameters based on the rigorous full-wave model. Two measurement techniques are reported for electrode-less characterization of thick ferroelectric films. The first method (X-band) is based on the reflection type measurement of a resonator established by a layered alumina/ferroelectric sample loaded in a cut-off waveguide. The second method (B-band) utilizes an open resonator (OR) technique. Theoretical and experimental results are presented.

ferroelectrics

impedance

dielectric properties

Films

Författare

Anatoli Deleniv

Chalmers, Teknisk fysik, Fysikalisk elektronik

Journal of the European Ceramic Society

0955-2219 (ISSN)

Vol. 27 8-9 2759-2764

Ämneskategorier

Annan materialteknik

Annan elektroteknik och elektronik

DOI

10.1016/j.jeurceramsoc.2006.11.051