Nanostructured carbon materials prepared by hole-mask colloidal lithography
Licentiate thesis, 2007
Research and development of nanofabrication methods can be motivated both for
manufacturing of commercially available products like micro electronic components
and for development of model systems for fundamental and applied science. The
fabrication process developed during this work, hole-mask colloidal lithography
(HCL), is primarily oriented towards the latter two, specifically for research in the
fields of catalysis, nanoparticle plasmons, and bio- and fundamental physics. Design
of structured samples with precise control over size and shape of the nanostructures
are crucial components in all of these fields.
The thesis describes the hole-mask colloidal lithography (HCL) technique, the general
principles of HCL and the technical and functional differences from standard colloidal
lithograpy (CL). The technique is illustrated with examples giving details on how to
fabricate features with diameters from ~40 to 400 nm and with different shapes and
mutual orientations. Some of the demonstrated geometries are discs, ellipses, cones,
particle pairs and particles buried into a TiO2 surface.
The nanostructuring of carbon materials using the HCL technique is described in
detail. Nanostructured carbon surfaces are relevant as model systems to study the
optical properties of naturally occurring nanocarbon structures like aerosols and
interstellar dust. The applied fabrication process utilizes oxygen plasma to etch the
part of the carbon surfaces, not protected by the HCL mask. Analysis of the structure
size and shape resulting from the applied process parameters gives information about
the materials durability in reactive oxygen atmospheres, which is valuable for
applications where carbon materials are exposed to similar environments.
The HCL technique is used to create etch-masks subsequently used to nanostructure
carbon surfaces via oxygen RIE. HOPG and GC surfaces are patterned in parallel
using identical fabrication processes. Careful characterization of the resulting size and
shape of the carbon nanostructures, using SEM and AFM, revealed a significant
difference in response to oxygen plasma treatments for the two materials. On HOPG
lateral etching under the etch mask is effectively suppressed thus resulting in
practically no undercut while GC is subject to severe etching under the masks. The
etch rate in the forward direction was found to be more than three times higher for GC
than HOPG (0.65 and 0.19 nm/s respectively). The HOPG nanostructuring process
was also followed with spectrophotometry, revealing decreased reflectance as a result
of the evolution of nanostructures. Part of the change in reflectance is due to the
presence of the etch mask, which consists of gold nanodiscs, but the major part is
attributed to the carbon nanostructures.
HOPG
GC
Colloidal Lithography
Oxygen
RIE
Nanofabrication