Novel high-k/metal gate materials
Paper in proceedings, 2007

Author

Olof Engström

Chalmers, Microtechnology and Nanoscience (MC2)

P.K. Hurley

O Buiu

M.C. Lemme

SiNANO Worksshop at ESSDERC 07, Munich

Subject Categories

Other Engineering and Technologies

More information

Created

10/6/2017