HSQ application for sub-10nm scale lithography.
Other conference contribution, 2004
An application of hydrogen silsesquioxane (HSQ) negative tone electron beam resist for a sub-10 nanometer
scale fabrication is reported.
neuromorphic networks
Electron beam nanolithography
Author
Piotr Jedrasik
Chalmers, Product and Production Development, Engineering and Industrial Design
Nano and Giga Challenges in Microelectronics, proceedings
Subject Categories
Other Electrical Engineering, Electronic Engineering, Information Engineering