Properties of Al2O3-films deposited on silicon by atomic layer epitaxy
Journal article, 1997

Author

Per Ericsson

Department of Solid State Electronics

Stefan Bengtsson

Department of Solid State Electronics

Jarmo Skarp

Microelectronic Engineering

Vol. 36 1-4 91-94

Subject Categories

Other Electrical Engineering, Electronic Engineering, Information Engineering

DOI

10.1016/S0167-9317(97)00022-1