Controlling deposition of nanoparticles by tuning surface charge of SiO2 by surface modifications
Journal article, 2016

The self-assembly of nanoparticles on substrates is relevant for a variety of applications such as plasmonics, sensing devices and nanometer-sized electronics. We investigate the deposition of 60 nm spherical Au nanoparticles onto silicon dioxide (SiO2) substrates by changing the chemical treatment of the substrate and by that altering the surface charge. The deposition is characterized by scanning electron microscopy (SEM). Kelvin probe force microscopy (KPFM) was used to characterize the surface workfunction. The underlying physics involved in the deposition of nanoparticles was described by a model based on Derjaguin–Landau–Verwey–Overbeek (DLVO) theory combined with random sequential adsorption (RSA). The spatial statistical method Ripley's K-function was used to verify the DLVO–RSA model (ERSA). The statistical results also showed that the adhered particles exhibit a short-range order at distances below ~300 nm. This method can be used in future research to predict the deposition densities of charged nanoparticles onto charged surfaces.

Author

Johnas Eklöf

Chalmers, Chemistry and Chemical Engineering, Applied Chemistry, Polymer Technology

Tina Gschneidtner

Chalmers, Chemistry and Chemical Engineering, Applied Chemistry, Polymer Technology

Samuel Lara Avila

Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics

Kim Nygård

University of Gothenburg

Kasper Moth-Poulsen

Chalmers, Chemistry and Chemical Engineering, Applied Chemistry, Polymer Technology

RSC Advances

2046-2069 (ISSN)

Vol. 6 106 104246-104253

Areas of Advance

Nanoscience and Nanotechnology

Subject Categories

Physical Chemistry

Materials Chemistry

Infrastructure

Chalmers Materials Analysis Laboratory

Nanofabrication Laboratory

DOI

10.1039/c6ra22412a

More information

Latest update

5/17/2018