Plasma-enhanced chemical vapour deposition growth of carbon nanotubes on different metal underlayers
Journal article, 2005

One important requirement for future applications of carbon nanotube electronic devices is the ability to controllably grow carbon nanotubes on metal electrodes. Here we show that it is possible to grow small diameter (<10 nm) vertically aligned carbon nanotubes on different metal underlayers using plasma-enhanced chemical vapour deposition. A crucial component is the insertion of a thin silicon layer between the metal and the catalyst particle. The electrical integrity of the metal electrode layer after plasma treatment and the quality of the metals as interconnects are also investigated.

carbon nanotubes nanofibres

Author

Mohammad Kabir

Chalmers, Microtechnology and Nanoscience (MC2), Solid State Electronics

Raluca Elena Morjan

Chalmers, Department of Experimental Physics, Atomic Physics

Oleg Nerushev

University of Gothenburg

Per Lundgren

Chalmers, Microtechnology and Nanoscience (MC2), Solid State Electronics

Stefan Bengtsson

Chalmers, Microtechnology and Nanoscience (MC2)

Peter Enoksson

Chalmers, Microtechnology and Nanoscience (MC2)

Eleanor E B Campbell

University of Gothenburg

Nanotechnology

0957-4484 (ISSN) 1361-6528 (eISSN)

Vol. 16 4 458-466

Subject Categories

Condensed Matter Physics

DOI

10.1088/0957-4484/16/4/022

More information

Created

10/7/2017