Interface defects in HfO2, LaSiOx and Gd2O3 high-k/metal gate structures on silicon: Energy distribution and passivation
Paper in proceedings, 2007

Author

P.K. Hurley

K. Cherkaoui

E O'Connor

A.W. Groenland

M.C. Lemme

H.D.B. Gottlob

M Schmidt

S. Hall

Y. Lu

O. Buiu

Bahman Raeissi

Chalmers, Microtechnology and Nanoscience (MC2)

Johan Piscator

Chalmers, Microtechnology and Nanoscience (MC2)

Olof Engström

Chalmers, Microtechnology and Nanoscience (MC2)

Proc. Electrochemical Society Meeting, Washington DC, October 2007

Subject Categories

Other Engineering and Technologies

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Created

10/6/2017