Formation stability and electronic structure of surfaces and interfaces from first principles
Doktorsavhandling, 2010
band structure
van der Waals interaction
electronic structure
graphane
graphene
atomic structure
growth
thin film
interface
density functional theory
CVD
Alumina
nucleation
Författare
Jochen Rohrer
Chalmers, Teknisk fysik, Elektronikmaterial
Ab initio thermodynamics of deposition growth: Surface terminations of TiC(111) and TiN(111) grown by chemical vapor deposition
Physical Review B - Condensed Matter and Materials Physics,;Vol. 82(2010)
Artikel i vetenskaplig tidskrift
Ab initio structure modelling of complex thin-film oxides: thermodynamical stability of TiC/thin-film alumina
Journal of Physics Condensed Matter,;Vol. 22(2010)p. 015004-
Artikel i vetenskaplig tidskrift
TEM and DFT investigation of CVD TiN/κ–Al2O3 multilayer coatings
Surface and Coatings Technology,;Vol. 202(2007)p. 522-531
Artikel i vetenskaplig tidskrift
Understanding adhesion at as-deposited interfaces from ab initio thermodynamics of deposition growth: thin-film alumina on titanium carbide
Journal of Physics Condensed Matter,;Vol. 22(2010)p. 472001-
Artikel i vetenskaplig tidskrift
Ämneskategorier
Övrig annan teknik
Den kondenserade materiens fysik
ISBN
978-91-7385-469-6
Doktorsavhandlingar vid Chalmers tekniska högskola. Ny serie: 3150
Opponent: Professor Karsten Wedel Jacobsen (DTU, Lyngby, DK)