Controlling the Intrinsic Josephson Junction Number in a Bi2Sr2CaCu2O8+δ Mesa
Artikel i vetenskaplig tidskrift, 2004

In fabricating Bi2Sr2CaCu2O8+δ intrinsic Josephson junctions in 4-terminal mesa structures, we modify the conventional fabrication process by markedly reducing the etching rates of argon ion milling. As a result, the junction number in a stack can be controlled quite satisfactorily as long as we carefully adjust those factors such as the etching time and the thickness of the evaporated layers. The error in the junction number is within ±1. By additional ion etching if necessary, we can controllably decrease the junction number to a rather small value, and even a single intrinsic Josephson junction can be produced.

etching rates

I–V curves

argon ion etching

intrinsic Josephson junctions

junction number

Författare

Lixing You

Japanese Journal of Applied Physics

0021-4922 (ISSN)

Vol. 43 4163-4165

Ämneskategorier

Fysik

DOI

10.1143/JJAP.43.4163