Influence of laser annealing on SiOx films properties
Artikel i vetenskaplig tidskrift, 2015

The interaction of laser irradiation with SiOx films, and the process of decomposition of SiOx on SiO2 and Si nanocrystals under the influence of laser irradiation are investigated. The mathematical modeling of temperature distribution in a c-Si wafer as well as on its surface is carried out. It is shown that laser pulses can efficiently heat up the samples of crystalline silicon. Using multi-pulse procedure, the temperature necessary for annealing can be achieved with lower intensity of laser irradiation. Experimental investigations of laser-annealed SiOx films allowed determining their transformation with the formation of nanoislands. It was concluded that the surface topology, dielectric matrix structure, and electrical conductivity depend on laser beam intensity during the annealing process.

PHOTOLUMINESCENCE

Applied

V636-637

FRANCE

Chemistry

Condensed Matter

V69

OPTICAL-PROPERTIES

CRYSTALLIZATION

Physics

RTUGAL

Laser annealing

Physical

Thermal conductivity equation

Coatings & Films

SILICON NANOCRYSTALS

MEMORY

RASBOURG

P444

P484

THIN-FILMS

DEPOSITION

Materials Science

Nanocrystal

LIGHT

Physics

Silicon oxide

Författare

O. O. Gavrylyuk

Institute of Surface Chemistry National Academy of Sciences in Ukraine

O. Y. Semchuk

Institute of Surface Chemistry National Academy of Sciences in Ukraine

O. V. Steblova

Institute of Semiconductors Physics, National Academy of Sciences in Ukraine

A. A. Evtukh

Institute of Semiconductors Physics, National Academy of Sciences in Ukraine

L. L. Fedorenko

Institute of Semiconductors Physics, National Academy of Sciences in Ukraine

O. L. Bratus

Institute of Semiconductors Physics, National Academy of Sciences in Ukraine

S. O. Zlobin

Institute of Semiconductors Physics, National Academy of Sciences in Ukraine

Magnus Karlsteen

Chalmers, Teknisk fysik, Kondenserade materiens fysik

Applied Surface Science

0169-4332 (ISSN)

Vol. 336 217-221

Ämneskategorier

Den kondenserade materiens fysik

DOI

10.1016/j.apsusc.2014.11.066

Mer information

Skapat

2018-01-24