Multiscale conformal pattern transfer
Artikel i vetenskaplig tidskrift, 2016

We demonstrate a method for seamless transfer from a parent flat substrate of basically any lithographic top-down or bottom-up pattern onto essentially any kind of surface. The nano-or microscale patterns, spanning macroscopic surface areas, can be transferred with high conformity onto a large variety of surfaces when such patterns are produced on a thin carbon film, grown on top of a sacrificial layer. The latter allows lifting the patterns from the flat parent substrate onto a water-air interface to be picked up by the host surface of choice. We illustrate the power of this technique by functionalizing broad range of materials including glass, plastics, metals, rough semiconductors and polymers, highlighting the potential applications in in situ colorimetry of the chemistry of materials, anti-counterfeit technologies, biomolecular and biomedical studies, light-matter interactions at the nanoscale, conformal photovoltaics and flexible electronics.




colloidal lithography

etch rates


Kristof Lodewijks

Chalmers, Fysik, Bionanofotonik

Vladimir Miljkovic

Chalmers, Fysik, Bionanofotonik

Ines Massiot

Chalmers, Fysik, Bionanofotonik

Addis Mekonnen

Chalmers, Fysik, Bionanofotonik

Ruggero Verre

Chalmers, Fysik, Bionanofotonik

Eva Olsson

Chalmers, Fysik, Eva Olsson Group

Alexander Dmitriev

Chalmers, Fysik, Bionanofotonik

Göteborgs universitet

Scientific Reports

2045-2322 (ISSN) 20452322 (eISSN)

Vol. 6 article no. 28490 - 28490



Annan fysik



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