X-RAY PHOTOELECTRON SPECTROSCOPY FOR LAYER-BY-LAYER PHASE ANALYSIS OF NbN THIN FILMS
Paper i proceeding, 2016

This paper studied the chemical and phase composition of NbN thin films by x-ray photoelectron spectroscopy (XPS). Determined the relative concentrations of (O, Nb, N, C, Si) and carried out layer-by-layer phase analysis of the films before sputtering and after each cycle of sputtering. Before spraying in the nitride film detected two different phase states niobium nitride, NbN, and presumably this Nb5N6. Analysis of the Nb 3d and C 1s lines allowed to reveal in addition to these phases of niobium nitride, various oxides of niobium (Nb2O5, NbO2, Nb2O3, NbO) and NbNOx

XPS

chemical composition

thin films

spectral lines

Författare

Alexander Lubenchenko

Alexander Batrakov

Alexey Pavolotskiy

Chalmers, Rymd- och geovetenskap

Sascha Krause

Chalmers, Rymd- och geovetenskap, Avancerad mottagarutveckling

Irina Shurkaeva

25th Spectroscopy Meeting

415-

Styrkeområden

Nanovetenskap och nanoteknik

Materialvetenskap

Ämneskategorier

Materialteknik

Nanoteknik

Den kondenserade materiens fysik

ISBN

978-5-4263-0442-0

Mer information

Skapat

2017-10-07