X-RAY PHOTOELECTRON SPECTROSCOPY FOR LAYER-BY-LAYER PHASE ANALYSIS OF NbN THIN FILMS

Paper i proceeding, 2016

This paper studied the chemical and phase composition of NbN thin films by x-ray photoelectron spectroscopy (XPS). Determined the relative concentrations of (O, Nb, N, C, Si) and carried out layer-by-layer phase analysis of the films before sputtering and after each cycle of sputtering. Before spraying in the nitride film detected two different phase states niobium nitride, NbN, and presumably this Nb5N6. Analysis of the Nb 3d and C 1s lines allowed to reveal in addition to these phases of niobium nitride, various oxides of niobium (Nb2O5, NbO2, Nb2O3, NbO) and NbNOx