The electrochemistry of iron oxide thin films nanostructured by high ion flux plasma exposure
Artikel i vetenskaplig tidskrift, 2017
Electrochemical impedance spectroscopy
Water splitting
Plasma exposure
Hematite
Magnetron sputtering
Författare
Rochan Sinha
Dutch Institute for Fundamental Energy Research (DIFFER)
Irem Tanyeli
Chalmers, Fysik, Kemisk fysik
Reinoud Lavrijsen
Technische Universiteit Eindhoven
M. C.M. van de Sanden
Technische Universiteit Eindhoven
Dutch Institute for Fundamental Energy Research (DIFFER)
Anja Bieberle-Hütter
Dutch Institute for Fundamental Energy Research (DIFFER)
Electrochimica Acta
0013-4686 (ISSN)
Vol. 258 709-717Ämneskategorier
Annan teknik
DOI
10.1016/j.electacta.2017.11.117