Radical Additions of Bis(trimethylsilyl)phosphite to Vinyltrimethylsilane and Vinyltriethoxysilane: Crystal Structure of 2-Trimethylsilylethylphosphonic Acid
Artikel i vetenskaplig tidskrift, 2003

Organosilicon-phosphonate compounds with the general formula (R)n(RO)3mnSi(CH2)mP(O)(OSiR'3)2 are designed for application as novel materials for surface treatments and modifications. A solvothermal method based on the reaction of bis(trimethylsilyl)phosphite with vinyltrimethylsilane and vinyltriethoxysilane in the presence of a peroxide in benzene solvent was used to synthesize the silyl-substituted esters of organosilicon-phosphonate compounds. 2-Trimethylsilylethanephosphonic acid was prepared from its bis(trimethylsilyl) ester by alcoholysis. The crystal structure of the acid consists of two-dimensional arrays built up from the (P--)O--H···O--P hydrogen bonds.

Crystal Structure

Surface Treatment

Hydrogen Bonding

Supramolecular Array

Författare

Amir H. Mahmoudkhani

Vratislav Langer

Chalmers, Institutionen för oorganisk miljökemi

Oliver Lindqvist

Chalmers, Institutionen för oorganisk miljökemi

Phosphorus, Sulfur and Silicon and the Related Elements

1042-6507 (ISSN) 1563-5325 (eISSN)

Vol. 178 10 2159-2168

Ämneskategorier

Kemi

DOI

10.1080/713744570