Radical Additions of Bis(trimethylsilyl)phosphite to Vinyltrimethylsilane and Vinyltriethoxysilane: Crystal Structure of 2-Trimethylsilylethylphosphonic Acid

Artikel i vetenskaplig tidskrift, 2003

Organosilicon-phosphonate compounds with the general formula (R)n(RO)3mnSi(CH2)mP(O)(OSiR'3)2 are designed for application as novel materials for surface treatments and modifications. A solvothermal method based on the reaction of bis(trimethylsilyl)phosphite with vinyltrimethylsilane and vinyltriethoxysilane in the presence of a peroxide in benzene solvent was used to synthesize the silyl-substituted esters of organosilicon-phosphonate compounds. 2-Trimethylsilylethanephosphonic acid was prepared from its bis(trimethylsilyl) ester by alcoholysis. The crystal structure of the acid consists of two-dimensional arrays built up from the (P--)O--H···O--P hydrogen bonds.