Strain Engineering in Highly Wrinkled CVD Graphene/Epoxy Systems
Artikel i vetenskaplig tidskrift, 2018
Chemical vapor deposition (CVD) is regarded as a promising fabrication method for the automated, large-scale, production of graphene and other two-dimensional materials. However, its full commercial exploitation is limited by the presence of structural imperfections such as folds, wrinkles, and even cracks that downgrade its physical and mechanical properties. For example, as shown here by means of Raman spectroscopy, the stress transfer from an epoxy matrix to CVD graphene is on average 30% of that of exfoliated monolayer graphene of over 10 μm in dimensions. However, in terms of electrical response, the situation is reversed; the resistance has been found here to decrease by the imposition of mechanical deformation possibly due to the opening up of the structure and the associated increase of electron mobility. This finding paves the way for employing CVD graphene/epoxy composites or coatings as conductive "networks" or bridges in cases for which the conductivity needs to be increased or at least retained when the system is under deformation. The tuning/control of such systems and their operative limitations are discussed here.
CVD graphene
electrical resistance
Raman spectroscopy
epoxy resin
wrinkles
Författare
George Anagnostopoulos
Institute of Chemical Engineering and High Temperature Chemical Processes
George Paterakis
Institute of Chemical Engineering and High Temperature Chemical Processes
Ioannis Polyzos
Institute of Chemical Engineering and High Temperature Chemical Processes
Panagiotis Nektarios Pappas
Institute of Chemical Engineering and High Temperature Chemical Processes
Kostantinos Kouroupis-Agalou
Istituto per la Sintesi Organica e la Fotoreattività (ISOF-CNR)
Nicola Mirotta
Istituto per la Sintesi Organica e la Fotoreattività (ISOF-CNR)
A. Scidà
Istituto per la Sintesi Organica e la Fotoreattività (ISOF-CNR)
Vincenzo Palermo
Chalmers, Industri- och materialvetenskap, Material och tillverkning
Istituto per la Sintesi Organica e la Fotoreattività (ISOF-CNR)
John Parthenios
Institute of Chemical Engineering and High Temperature Chemical Processes
Konstantinos Papagelis
Institute of Chemical Engineering and High Temperature Chemical Processes
Aristotelio Panepistimio Thessalonikis
C. Galiotis
Institute of Chemical Engineering and High Temperature Chemical Processes
Panepistimion Patron
ACS Applied Materials & Interfaces
1944-8244 (ISSN) 1944-8252 (eISSN)
Vol. 10 49 43192-43202Ämneskategorier
Textil-, gummi- och polymermaterial
Annan materialteknik
Kompositmaterial och -teknik
DOI
10.1021/acsami.8b14698