The growth of graphene on Ni–Cu alloy thin films at a low temperature and its carbon diffusion mechanism
Artikel i vetenskaplig tidskrift, 2019

Carbon solid solubility in metals is an important factor affecting uniform graphene growth by chemical vapor deposition (CVD) at high temperatures. At low temperatures, however, it was found that the carbon diffusion rate (CDR) on the metal catalyst surface has a greater impact on the number and uniformity of graphene layers compared with that of the carbon solid solubility. The CDR decreases rapidly with decreasing temperatures, resulting in inhomogeneous and multilayer graphene. In the present work, a Ni–Cu alloy sacrificial layer was used as the catalyst based on the following properties. Cu was selected to increase the CDR, while Ni was used to provide high catalytic activity. By plasma-enhanced CVD, graphene was grown on the surface of Ni–Cu alloy under low pressure using methane as the carbon source. The optimal composition of the Ni–Cu alloy, 1:2, was selected through experiments. In addition, the plasma power was optimized to improve the graphene quality. On the basis of the parameter optimization, together with our previously-reported, in-situ, sacrificial metal-layer etching technique, relatively homogeneous wafer-size patterned graphene was obtained directly on a 2-inch SiO2 /Si substrate at a low temperature (~600◦ C).

Insulating substrate

Chemical vapor deposition

Transfer-free

Graphene

Low temperature growth

Lithography-free

Författare

Y. B. Dong

Beijing University of Technology

Sheng Guo

Chalmers, Industri- och materialvetenskap, Material och tillverkning

H. H. Mao

Thermo-Calc Software AB

Kungliga Tekniska Högskolan (KTH)

Chen Xu

Beijing University of Technology

Y. Xie

Beijing University of Technology

Chuangtong Cheng

Chinese Academy of Sciences

Xurui Mao

Chinese Academy of Sciences

J. Deng

Beijing University of Technology

G. Z. Pan

Beijing University of Technology

Jie Sun

Beijing University of Technology

Chalmers, Mikroteknologi och nanovetenskap (MC2), Kvantkomponentfysik

Nanomaterials

20794991 (eISSN)

Vol. 9 11 1633

Ämneskategorier

Materialkemi

Annan kemiteknik

Metallurgi och metalliska material

DOI

10.3390/nano9111633

Mer information

Senast uppdaterat

2019-12-03