Novel monocrystalline silicon micromirrors for maskless lithography
Preprint, 2007

A novel monocrystalline silicon micromirror structure for improving image fidelity in laser pattern generators is presented. Analytical and finite element analysis of the structure as well as an outline of a fabrication scheme to realize the structure are given. The spring constant of the micromirror structure can be designed independently of the stiffness of the mirror surface. This makes it possible to design a mirror with very good planarity, resistance to sagging during actuation, and it reduces influence from stress in reflectivity-increasing multilayer coatings.

DRIE

Micromirrors

EUV lithography

Electrostatic actuation

Transfer bonding

Maskless Lithography

Författare

Martin Bring

Chalmers, Mikroteknologi och nanovetenskap (MC2)

Peter Enoksson

Chalmers, Mikroteknologi och nanovetenskap (MC2)

Ämneskategorier

Annan elektroteknik och elektronik