Vertical scaling of gate-to-channel distance for a 70 nm InP pseudomorphic HEMT technology
Paper in proceeding, 2005
Author
Malin Borg
Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics
Jan Grahn
Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics
Shu Min Wang
Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics
Anders Mellberg
Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics
Herbert Zirath
Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics
Proceed. of Conf on InP and Related Materials (IPRM'05)
204-207
Subject Categories
Other Electrical Engineering, Electronic Engineering, Information Engineering