Vertical scaling of gate-to-channel distance for a 70 nm InP pseudomorphic HEMT technology
Paper in proceedings, 2005

Author

Malin Borg

Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics

Jan Grahn

Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics

Shu Min Wang

Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics

Anders Mellberg

Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics

Herbert Zirath

Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics

Proceed. of Conf on InP and Related Materials (IPRM'05)

204-207

Subject Categories

Other Electrical Engineering, Electronic Engineering, Information Engineering

More information

Created

10/6/2017