Hole mask colloidal lithography on magnetic multilayers for spin torque applications
Paper in proceeding, 2010

We demonstrate the fabrication of metallic nano-contacts on magnetic multilayers using a Hole Mask Colloidal Lithography technique (HCL) based on Polystyrene spheres. The method applies PMMA as a sacrificial layer upon which a hole pattern is formed after lift- off of the spheres. An Au layer functions as a hard mask for the PMMA and the PMMA subsequently masks the SiO2 during its etching. The resulting pattern is a dense collection of randomly located nano-holes through a SiO2 film. Final devices are made using traditional photolithography to define a 600 nm circular mesa with about 3 to 4 nano-holes per device, and patterning of a metallic top contact.


Sohrab R. Sani

Royal Institute of Technology (KTH)

Johan Persson

Royal Institute of Technology (KTH)

Alexander Dmitriev

Chalmers, Applied Physics, Bionanophotonics

Mikael Käll

Chalmers, Applied Physics, Bionanophotonics

Johan Åkerman

University of Gothenburg

Journal of Physics: Conference Series

17426588 (ISSN) 17426596 (eISSN)

Vol. 200 SECTION 7 072078- 072078

Subject Categories

Condensed Matter Physics



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