Hole mask colloidal lithography on magnetic multilayers for spin torque applications
Paper in proceeding, 2010
Author
Sohrab R. Sani
Royal Institute of Technology (KTH)
Johan Persson
Royal Institute of Technology (KTH)
Alexander Dmitriev
Chalmers, Applied Physics, Bionanophotonics
Mikael Käll
Chalmers, Applied Physics, Bionanophotonics
Johan Åkerman
University of Gothenburg
Published in
Journal of Physics: Conference Series
17426588 (ISSN) 17426596 (eISSN)
Vol. 200 Issue SECTION 7 p. 072078- art. no 072078Categorizing
Subject Categories (SSIF 2011)
Condensed Matter Physics
Identifiers
DOI
10.1088/1742-6596/200/7/072078